| 摘要 |
PROBLEM TO BE SOLVED: To provide a stereo lithography device and a stereo lithography method, which are capable of effecting a surface exposure with a simple constitution. SOLUTION: A stereo lithography device is provided with a control means for outputting data with respect to stereo lithography, a means for producing a mark for a light transmissive member in accordance with data for one layer, a means D for forming the green resin layer of a photo-setting resin for one layer, a means for disposing a light transmissive member 31 consisting of the green resin layer provided with the mask in close contact with the same, an exposure means 53 for exposing the photo-setting resin through the mask and a retreating means for treating the photo transmitting member 31 after exposing the photo-setting resin while a stereo lithography, employing respective means, is repeated.
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