发明名称 ABERRATION MEASURING INSTRUMENT AND MEASURING METHOD, PROJECTION EXPOSURE APPARATUS PROVIDED WITH THE INSTRUMENT AND DEVICE-MANUFACTURING METHOD USING THE MEASURING METHOD, AND EXPOSURE METHOD
摘要 <p>An aberration measuring apparatus has a converging lens L for converging light beams traveling through a measurement target optical system PL on a predetermined surface IP, an aperture stop AP for transmitting a part of the light beams, a converging position detection unit DET for detecting a positional deviation of a converging position P of a part of the light beams traveling through the aperture stop on the predetermined surface IP, a moving unit M for moving the aperture stop in a direction intersecting an optical axis, and an arithmetic processing unit for calculating an aberration of the measurement target optical system PL on the basis of an output signal from the converging position detection unit DET. &lt;IMAGE&gt;</p>
申请公布号 EP1079223(A1) 申请公布日期 2001.02.28
申请号 EP19990921174 申请日期 1999.05.19
申请人 NIKON CORPORATION 发明人 TAKEUCHI, HITOSHI
分类号 G01M11/02;G03F7/20;(IPC1-7):G01M11/02;H01L21/027 主分类号 G01M11/02
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