| 摘要 |
A method for fabricating an optical waveguide, comprising the following steps. That is, forming an optical waveguide on surface of a substrate via an atmospheric pressure chemical vapor deposition (AP-CVD) method using a silica raw material containing an organic material, and irradiating ultraviolet light on at least a portion of that optical waveguide. The refractive index of the portion of the optical waveguide irradiated with ultraviolet light increases. Since changing the refractive index in this way enables the formation of a diffraction grating, it is possible to manufacture optical filters and wavelength dispersion devices.
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