发明名称 DEVICE AND METHOD FOR DRYING AND WASHING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To dry a substrate to a clean state without generating a water mark, contamination, or the like on a surface by moving a nozzle in parallel with the surface of a substrate to be dried, and at the same time in the radial direction from the center of the substrate to be dried to an outer periphery. SOLUTION: A demineralized water nozzle 33 and an inert gas injection nozzle 43 are slantingly mounted so that the injection directions of nozzles oppose each other, and the inert gas injection nozzle 43 and the demineralized water nozzle 33 are positioned at the center and outer-periphery sides of a substrate 2, respectively. In the inert gas injection nozzle, an inert gas introduction pipe 45 is provided, an inert gas being introduced from the inert gas introduction pipe is jetted out of an injection port 46 at a lower end, thus eliminating a demineralized water film 14 on the surface of the substrate 2 in a concentric circle shape from nearly the center of the substrate to an outer periphery for forming a drying region 13. Then, a support rod 31 can be rotated around the vertical center shaft, and is rotated by a motor.
申请公布号 JP2001053051(A) 申请公布日期 2001.02.23
申请号 JP19990226226 申请日期 1999.08.10
申请人 PRE-TECH CO LTD 发明人 FUJITA TAKUMI;SHIBA KAZUHIKO
分类号 B08B3/02;B08B3/08;B08B3/12;F26B21/00;H01L21/304;(IPC1-7):H01L21/304 主分类号 B08B3/02
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