发明名称 APPARATUS AND METHOD OF PRODUCING TANTALUM BY CONTINUOUS PROCESS
摘要 <p>A tantalum production apparatus and method for producing tantalum by repeating a series of processes is provided. The tantalum production apparatus includes a vaccum means for preventing tantalum from being combined with oxygen and oxidized, a heating means for heating a reaction container up to a predetermined temperature in which a reduction agent and a reaction salt are contained, so that the reduction agent and the reaction salt generate electrons by a reduction reaction, and an electron moving means for continuously moving the electrons generated by the reduction reaction to a raw material charging container in the reaction container. The tantalum production method includes a calcination step for discharging oxygen from the reaction container, and heating a reduction agent and a reaction salt to a predetermined vacuum pressure and a predetermined temperature for a predetermined time, an electron generation step for generating electrons in which the reduction agent and the reaction salt which have been heated in the calcination step are liquefied, and a tantalum production step for producing tantalum in which the electrons generated in the electron generation step are reacted with a raw material.</p>
申请公布号 WO2001012867(A1) 申请公布日期 2001.02.22
申请号 KR2000000912 申请日期 2000.08.16
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