MANUFACTURE OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To enable fluctuation reduction and enhance reliability by radiating the pulse laser beam having a cross-section extended only in one direction to an island type semiconductor film while a substrate is moved in the direction vertical to one direction. SOLUTION: An optical beam is amplified by an amplifier 3 via total reflection mirrors 5, 6 and is then guided to an optical system 4 via total reflection mirrors 7, 8. The initial laser beam has the rectangular cross-section of about 3×2 cm2 but the laser beam is then processed with this optical system 4 to a narrower beam in the length of 10 to 30 cm and in the width of about 0.1 to 1 cm. Such a narrower beam is effective to improve processability. That is, the narrower beam is radiated to a sample 11 via the total reflection mirror 9 after leaving the optical system 4. But, since the width of the beam is larger than the width of sample, it is enough that the sample is moved only in one direction. Therefore, the sample stage and drive apparatus 10 are formed in the simplified structure and assures simplified maintenance.