APPARATUS FOR WET-PROCESSING SEMICONDUCTOR

摘要

PURPOSE: An apparatus for wet-processing a semiconductor is to remove a droplet generating from a wet-processing device, therefor preventing the contamination of the wet-processing device. CONSTITUTION: An apparatus for wet-processing a semiconductor comprises a support(13) for connecting a chuck(15) to a hanger(11), and a slope rod(17) which is enclosing a horizontal shaft of a device so as to induce a splashed droplet into an appropriate position. When a wafer passed through a container containing a sulfuric acid is immersed into a container of a pure water, the droplets are generated due to an action of the sulfuric acid with the pure water. The splashed droplets in the chuck and the support are flowed down to an under portion of the chuck by the gravity. The splashed droplets in the hanger portion are flowed down to the chuck along an under slope surface enclosing the hanger via the support.