发明名称 |
Alignment mark strategy for oxide CMP |
摘要 |
A method for generating alignment marks on the scribe lines in which alignment marks are generated only at oxide layers is described. An alignment mark is formed in an oxide layer on a scribe line of a wafer. The alignment mark is lined with a metal layer and filled with a dielectric layer which is planarized. The alignment mark is used in aligning a reticle to pattern the metal layer and is also used in aligning a reticle to pattern the dielectric layer wherein the step of lining the alignment mark with the metal layer protects the alignment mark.
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申请公布号 |
US6184104(B1) |
申请公布日期 |
2001.02.06 |
申请号 |
US19980151158 |
申请日期 |
1998.09.10 |
申请人 |
CHARTERED SEMICONDUCTOR MANUFACTURING LTD. |
发明人 |
TAN JUAN BOON;NEOH SOON EE |
分类号 |
G03F9/00;H01L23/544;(IPC1-7):H01L21/465 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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