ROUND-SHAPED SUBSTRATE CLEANING APPARATUS

摘要

PROBLEM TO BE SOLVED: To clean a round shaped substrate highly accurately by reducing the possibility of polluting the round-shaped substrate with a pollutant such as particles and preventing cleaning effect of the round-shaped substrate from being influenced by ultrasonic waves emitted from an ultrasonic wave generator. SOLUTION: The round-shaped substrate cleaning apparatus 10 for cleaning round-shaped substrate 100 comprises a plurality of treatment chambers 22, 24, 26, 28 provided on a circumference and respectively having cleaning units for cleaning the round-shaped substrate, a plurality of transporting and supporting members 20 having a plurality of arms extended radially for holding the respective round-shaped substrates and placing the plurality of the round- shaped substrates thus held to positions where the substrates can be cleaned by the respective cleaning units in the treatment chambers and a moving means 18 for relatively moving the positions of the treatment chambers and the arms of the transporting and supporting member, sequentially.