发明名称 CHEMICAL AMPLIFICATION NEGATIVE TYPE RESIST COMPOSITION
摘要 PURPOSE: To enhance resolution by incorporating an alkali-soluble resin, a crosslinking agent, a specified N-substituted succinimide compound and an acid generating agent other than the succinimide compound. CONSTITUTION: The chemical amplification negative type resist composition contains an alkali-soluble resin, a crosslinking agent, an N-substituted succinimide compound of the formula and an acid generating agent other than the succinimide compound. In the formula, R is optionally substituted alkyl, the residue of an alicyclic hydrocarbon, aryl or camphor. It is supposed that the N-substituted succinimide compound promotes the solubility of the unexposed part of the resist composition, increases contrast and enhances resolution because the compound is hydrolyzed with an alkali developing solution by a prescribed scheme and changes from the water-insoluble state to a water-soluble state.
申请公布号 KR20010007144(A) 申请公布日期 2001.01.26
申请号 KR20000029279 申请日期 2000.05.30
申请人 SUMITOMO CHEM CO LTD 发明人 KAMIYA YASUNORI;YAMADA AIRI;INOUE HIROTAKA
分类号 H01L21/027;G03F7/004;G03F7/038;(IPC1-7):H01L21/027 主分类号 H01L21/027
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