发明名称 CHEMICAL DISCHARGE APPARATUS
摘要 PROBLEM TO BE SOLVED: To obtain a chemical discharge apparatus which is capable of restraining gas from penetrating into a chemical piping. SOLUTION: A chemical discharge apparatus 30 is equipped with a canister 32 which contains chemicals, a nitrogen gas injection pipe 34, a chemical piping 40 whose root is dipped into chemicals contained in the canister 32, and tip is provided with a chemical discharge piping 36 and which is provided with an open/close valve 38 located between its root and tip. The apparatus 30 is equipped with a gas separating tank 42 provided between the canister, and the open/close valve and a nitrogen gas discharge pipe 44, which is connected to the upper part of the gas separating tank to discharge nitrogen gas from the gas separating tank. The apparatus is equipped with a liquid level detector 46, which detects the liquid level of chemical contained in the gas separating tank and a control device 48, which automatically opens or closes the automatic open/close valve of the nitrogen gas discharge pipe 44 depending on the liquid level of chemicals detected by the liquid level detector.
申请公布号 JP2001023949(A) 申请公布日期 2001.01.26
申请号 JP19990191322 申请日期 1999.07.06
申请人 SONY CORP 发明人 NOMURA TAKUYA
分类号 H01L21/306;H01L21/304;(IPC1-7):H01L21/306 主分类号 H01L21/306
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