| 摘要 |
PROBLEM TO BE SOLVED: To deteriorate patterning characteristics, even though a chemical amplification type resist after pattern exposure is exposed to basic gas. SOLUTION: This substrate processor is obtained by connecting a housing chamber 1, provided with at least one of an applying part for applying the photosensitive resin film of a chemical amplified type to a substrate, the developing part of the photosensitive resin film, an applying part for applying surface active agent to the substrate and the bake part of the substrate bake part of the substrate and an exposure chamber 2 of photosensitive resin film via a carrying chamber 4 made into an acid atmosphere. Thus, the basic gas brought into from another device is completely neutralized in the chamber 4, to make an environment within the chamber 4 neutral or weakly acidic atmosphere. Thus, even at the time of being exposed to the basic atmosphere for a long period, especially before stoppage of a deice caused by an accident, the basic atmosphere is neutralized by acid, thereby the photosensitive resin film is prevented from becoming slightly soluble and being disabled to form a pattern as the result. In addition, an expendable material such as a chemical filter, etc., and basic gas monitoring monitor are dispensed with.
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