Method for writing a pattern using multiple variable shaped electron beams

摘要

A method of operating multiple beam direct write e-beam system employs a set of miniature beam writing modules acting in parallel, each of which employs the combination of a uniform magnetic field and a uniform parallel electric field to form an image of a low-brightness electron emitting surface and also to modify the shape of an initially square beam, thereby producing a set of separately and independently modified beams; the modified beams are deflected in parallel by the same magnetic field and a uniform transverse electric field to cover a desired area; emitters, beamshaping deflection electrodes and fine-deflection electrodes are formed by microlithographic techniques.