| 摘要 |
PROBLEM TO BE SOLVED: To polish a recording medium such as a magnetic disc and an integrated circuit board with high precision by specifying the surface roughness of an abrasive cloth including extra fine fiber. SOLUTION: The non-woven fabric of an abrasive cloth is manufactured by entangling extra fine fiber of 0.3 dtex or less. A polymer applicable to this extra fine fiber is selected from polyester, polyphenylene sulfide, polyaramide, polyolefin, polyacryl and polyimide, in particular, polyester and polyphenylen sulfide can be preferably used. The obtained non-woven fabric base material is used as an A-type base material as it is, and more preferably, uses as a B-type base material by applying an elastomer to the non-woven fabric. By pressing and heating the obtained abrasive cloth base material, its surface is smoothened, the total configuration is stabilized, and the surface roughness of the abrasive cloth becomes 60 μm or less. |
