| 摘要 |
PROBLEM TO BE SOLVED: To form a dense and perfect compd. film on a substrate. SOLUTION: The vicinity of the upper part of a vapor depositing source 14 in a vacuum tank is provided with a 1st ring shape 16b, and the vicinity of the lower part of a substrate dome 18 fixing a vapor depositing substrate is provided with a 2nd ring shape 16a to compose one high-frequency ring 16 of the 1st ring shape 16b and the 2nd ring shape 16a, and the high-frequency ring 16 is applied with high-frequency electric power from a high-frequency power source 20, thereby forming a dense and perfect compd. thin film on the vapor depositing substrate.
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