| 摘要 |
<p>A water-soluble resin composition comprising (1) a water-soluble resin, (2) a water-soluble crosslinking agent, (3) at least one surfactant selected among acetylene alcohols, acetylene glycols, polyethoxylates of acetylene alcohols, and polyethoxylates of acetylene glycols, and (4) a solvent which is either water or a mixture of water and a water-soluble solvent. The water-soluble resin composition is applied to a resist pattern and heated to thereby crosslink the resin with an acid supplied from the resist. Subsequently, the uncrosslinked areas of the water-soluble resin coating layer are removed in development. This composition is excellent in applicability on resist pattern steps and in dimensional control in forming finer patterns. Consequently, resist patterns including trench patterns and hole patterns can be effectively made finer.</p> |
