| 摘要 |
A multi-beam scanning optical apparatus employs a beam pitch adjusting system in which the position of a first beam is detected by using a beam position detecting system composed of a knife edge shaped plate and one photo sensor, and in which the optical path of the second beam is corrected so that the position of the second beam may be at a specified distance from the position of the first beam. A further embodiment of the beam pitch adjusting systems includes a beam position detecting system using a line position sensor by CCD or PSD. A yet further embodiment of the beam pitch adjusting system includes a position detecting system utilizing the power of a beam efficiently by disposing a focusing lens on an optical path of the beam. Hence, beam pitch adjustment is facilitated, the pitch adjustment precision is enhanced, the range of pitch adjustment is optimized, the number of parts is reduced, and space is saved.
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