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发明名称
EXPOSURE MASK FOR SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要
申请公布号
KR100284069(B1)
申请公布日期
2000.12.15
申请号
KR1019970027715
申请日期
1997.06.26
申请人
发明人
分类号
主分类号
代理机构
代理人
主权项
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