发明名称 WIRING FORMING METHOD AND DEVICE, WIRING AND INTEGRATED CIRCUIT
摘要 PROBLEM TO BE SOLVED: To provide a wiring forming method which is capable of filling a hole (connection hole) bored in an insulating body sufficiently with conductive material preventing voids. SOLUTION: A connection hole is formed through a connection hole forming process and a cleaning process, and the inner wall surface of the connection hole is made to adsorb material (active site) which has a chemical affinity through a surface treatment process S1. Then, material which has properties to donate electrons making active sites serve as nucleuses is deposited as a film on the surface of the connection hole through an electron-donating film forming process S2. Then, a wiring material is filled into the connection hole through a filling process S3.
申请公布号 JP2000349149(A) 申请公布日期 2000.12.15
申请号 JP19990155887 申请日期 1999.06.03
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC 发明人 OBA TAKAYUKI
分类号 H01L21/77;C23C16/02;H01L21/28;H01L21/285;H01L21/768;(IPC1-7):H01L21/768 主分类号 H01L21/77
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