发明名称 |
WIRING FORMING METHOD AND DEVICE, WIRING AND INTEGRATED CIRCUIT |
摘要 |
PROBLEM TO BE SOLVED: To provide a wiring forming method which is capable of filling a hole (connection hole) bored in an insulating body sufficiently with conductive material preventing voids. SOLUTION: A connection hole is formed through a connection hole forming process and a cleaning process, and the inner wall surface of the connection hole is made to adsorb material (active site) which has a chemical affinity through a surface treatment process S1. Then, material which has properties to donate electrons making active sites serve as nucleuses is deposited as a film on the surface of the connection hole through an electron-donating film forming process S2. Then, a wiring material is filled into the connection hole through a filling process S3.
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申请公布号 |
JP2000349149(A) |
申请公布日期 |
2000.12.15 |
申请号 |
JP19990155887 |
申请日期 |
1999.06.03 |
申请人 |
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC |
发明人 |
OBA TAKAYUKI |
分类号 |
H01L21/77;C23C16/02;H01L21/28;H01L21/285;H01L21/768;(IPC1-7):H01L21/768 |
主分类号 |
H01L21/77 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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