发明名称 IMPROVED INTEGRATED CIRCUIT ISOLATING STRUCTURE AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To provide an IC isolating structure which enables downsizing of the dimension, and its manufacture. SOLUTION: An IC isolating structure 40 has a recess 56 provided in a conductive layer possessing a surface section. The recess 56 has a sidewall adjacent to the surface section, and moreover the isolating structure 40 further has an insulator which is provided in the recess and overlaps the surface part. Accordingly, hereby when a transistor is provided within the conductive layer, adjacent to the sidewall of the recess, the overlapping section of the insulator increases the interval between the angle of the upper recess and a gate electrode.
申请公布号 JP2000340648(A) 申请公布日期 2000.12.08
申请号 JP20000140578 申请日期 2000.05.12
申请人 STMICROELECTRONICS INC 发明人 MORGAN ERIC G;VANDENBOSSCHE ERIC;SINGHAL PIYUSH M
分类号 H01L21/76;H01L21/762;H01L27/08;H01L29/78;(IPC1-7):H01L21/76 主分类号 H01L21/76
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