| 摘要 |
PROBLEM TO BE SOLVED: To provide the radiation sensitive composition high in sensitivity and good in storage stability and capable of forming a resist pattern good in form. SOLUTION: The radiation sensitive composition comprises a resin to be raised in alkali solubility by action of acids and a photoacid generator and further, a primary carboxamide having an alcoholic hydroxy group in the molecule represented by the formula in which Q1 is an optionally substituted alkyl group; each of Q2 and Q3 is, independently, an H atom or an optionally substituted alkyl group; and at least one of Q1-Q3 is an alkyl group substituted by a hydroxy group. |
