| 发明名称 |
X-RAY EXPOSURE APPARATUS, X-RAY EXPOSING METHOD, X-RAY MASK, X-RAY MIRROR, SYNCHROTRON RADIATOR, SYNCHROTRON RADIATING METHOD, AND SEMICONDUCTOR DEVICE |
| 摘要 |
An X-ray radiator comprises an X-ray mirror (3, 3a-3c, 11-14) containing a material having an X-ray absorption edge in only at least either the wavelength region below 0.45 nm or the wavelength region above 0.7 nm.
|
| 申请公布号 |
WO0074119(A1) |
申请公布日期 |
2000.12.07 |
| 申请号 |
WO2000JP03337 |
申请日期 |
2000.05.24 |
| 申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA;CANON KABUSHIKI KAISHA;ITOGA, KENJI;KITAYAMA, TOYOKI;WATANABE, YUTAKA;UZAWA, SHUNICHI |
发明人 |
ITOGA, KENJI;KITAYAMA, TOYOKI;WATANABE, YUTAKA;UZAWA, SHUNICHI |
| 分类号 |
G21K5/02;G03F7/20;G21K1/06;G21K1/10;G21K5/04;H05H13/04;(IPC1-7):H01L21/027 |
主分类号 |
G21K5/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
