发明名称 ELECTRON BEAM ALIGNER AND ELECTRON BEAM EXPOSING METHOD
摘要 PROBLEM TO BE SOLVED: To ensure high precision connection accuracy by calculating the compensation amount of the variable molding shot size for the electron beam exposure from the variable molding shot position and variable molding shot size based on the design value. SOLUTION: For the information of the variable molding shot position Qn on the design data outputted from an arithmetic unit 21, the information of the shot compensation position Pn compensated from the approximated compensation formula of the variable molding shot in the position compensation processing unit 20 is then outputted to a deflector 17. In this case, simultaneously, both information of the shot compensation position Pn outputted from the position compensation processing unit 20 and the information of shot size V on the design data outputted from the arithmetic unit 21 are outputted to a size compensation processing unit 19. In the size compensation processing unit 19, size compensation to the variable molding beam is conducted based on the information of the shot compensation position Pn and the information of shot size Vn and data is then outputted to a molding deflector 14. As explained above, variable molding shot position can be compensated and simultaneously exposing is executed while compensating for the size.
申请公布号 JP2000340494(A) 申请公布日期 2000.12.08
申请号 JP19990151140 申请日期 1999.05.31
申请人 NEC CORP 发明人 ONODA ATARU
分类号 H01J37/147;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 H01J37/147
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