发明名称 |
METHOD FOR EFFECTIVELY USING VACUUM PUMP IN SEMICONDUCTOR MANUFACTURING SYSTEM |
摘要 |
PURPOSE: A method for effectively using a vacuum pump in a semiconductor manufacturing system is provided to have the inside of a loadlock chamber and a transfer chamber become a vacuum state by using an auxiliary pump, in which the loadlock chamber and transfer chamber do not need utility such as nitrogen. CONSTITUTION: An auxiliary pump operates to maintain a vacuum state of a loadlock chamber when a wafer is induced to the loadlock chamber. The auxiliary pump operates to maintain a vacuum state of a transfer chamber when the wafer is transferred from the loadlock chamber to the transfer chamber. A main pump operates to maintain a vacuum state of a main process chamber when the wafer is transferred from the transfer chamber to the main process chamber. A wafer process is performed in the main process chamber.
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申请公布号 |
KR20000066962(A) |
申请公布日期 |
2000.11.15 |
申请号 |
KR19990014405 |
申请日期 |
1999.04.22 |
申请人 |
SAMSUNG ELECTRONICS CO, LTD. |
发明人 |
KIM, YONG UK |
分类号 |
H01L21/02;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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主权项 |
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地址 |
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