发明名称 METHOD FOR EFFECTIVELY USING VACUUM PUMP IN SEMICONDUCTOR MANUFACTURING SYSTEM
摘要 PURPOSE: A method for effectively using a vacuum pump in a semiconductor manufacturing system is provided to have the inside of a loadlock chamber and a transfer chamber become a vacuum state by using an auxiliary pump, in which the loadlock chamber and transfer chamber do not need utility such as nitrogen. CONSTITUTION: An auxiliary pump operates to maintain a vacuum state of a loadlock chamber when a wafer is induced to the loadlock chamber. The auxiliary pump operates to maintain a vacuum state of a transfer chamber when the wafer is transferred from the loadlock chamber to the transfer chamber. A main pump operates to maintain a vacuum state of a main process chamber when the wafer is transferred from the transfer chamber to the main process chamber. A wafer process is performed in the main process chamber.
申请公布号 KR20000066962(A) 申请公布日期 2000.11.15
申请号 KR19990014405 申请日期 1999.04.22
申请人 SAMSUNG ELECTRONICS CO, LTD. 发明人 KIM, YONG UK
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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