| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method and a device for automatically measuring elements of a deviation in the position of the imaging point in lens aberration which includes the deviation in position due to distortion as well as coma aberration. SOLUTION: A main scale 1 forms a first diffraction grating by arranging a plurality of relatively large patterns, and a sub scale 2 forms a second diffraction grating by arranging line and space patterns with a prescribed pitch and the array of the respective line and space orthogonally crosses the direction of the second diffraction lattice. A mask which includes the main scale 1 and the sub scale 2 is used to align and develop a photosensitive substrate. Then a distance between the two diffraction gratings formed on the photosensitive substrate is scanned by using a coherent light, having a diffractable wavelength and coherence, thereby measuring distortions including elements of positional deviation in imaging point due to coma aberrations.</p> |
