发明名称 MANUFACTURE OF THIN-FILM SENSOR
摘要 PROBLEM TO BE SOLVED: To obtain a manufacturing method for a thin-film sensor which has an insulating thin film with a small drop in an insulating characteristic even under a high-temperature environment and by which a physical change amount such as a stress, a temperature or the like acting on an object to be measured can be measured surely. SOLUTION: In this method for manufacturing this thin-film sensor which measures a physical change amount such as a stress, a temperature or the like acting on an object 1 to be measured, a plurality of insulating thin-film layers 2, 3,... are laminated on the object 1, an insulating thin film is formed, and a sensor membrane is attached to the insulating thin film, The method is provided with a polishing process in which, before a next insulating thin-film layer is formed, the surface of the insulating thin-film layers 2, 3,... formed on the object 1 is polished.
申请公布号 JP2000310548(A) 申请公布日期 2000.11.07
申请号 JP19990120759 申请日期 1999.04.27
申请人 ISHIKAWAJIMA HARIMA HEAVY IND CO LTD 发明人 IDA FUTOSHI;TERASAKI KIMIHIRO
分类号 G01L1/18;G01D21/00;(IPC1-7):G01D21/00 主分类号 G01L1/18
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