| 摘要 |
PROBLEM TO BE SOLVED: To obtain a composition capable of forming a coating film excellent in resistances to oxygen plasma and cracks and in dielectric properties by incorporating (A) a hydrolyzate of an alkoxy silane and (B) a hydrolyzate of a silane compound comprising an alkoxycyclosilane and a silane polymer and/or the condensates of ingredients A and B into the same. SOLUTION: This composition contains (A) a hydrolyzate of a compound of the formula: R1aSi(OR2)4-a and (B) a hydrolyzate of a silane compound comprising a compound of the formula and a polymer having repeating units of the formula: -Si(OR5)2-b(R6)bO- and/or the condensates of ingredients A and B. In the formulas, R1 to R6 are each a monovalent organic group; a is 0-2; b is 0-1; and n is 3-10, These hydrolyzates and/or condensates form a two-dimensional or three-dimensional structure, forming a high-mol.-wt. polyorganosiloxane. When applied to a substrate (e.g. a silicone wafer) and subjected to thermal polycondensation, the composition, containing the polyorganosiloxane, forms a glassy or macromolecular film excellent in adbesiveness.
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