ENERGY SENSITIVE RESIST MATERIAL AND PRODUCTION OF ELEMENT USING SAME

摘要

PROBLEM TO BE SOLVED: To reduce the amount of aromatic compounds discharged as gases from a resist in a lithographic process by forming a layer of an energy sensitive resist material containing a polymer, a photo-acid generating body and a scavenger which reacts with an aryl radical on a substrate and exposing the layer to radiation through a pattern. SOLUTION: The energy sensitive resist material contains at least one of a polymer from which an acid-labile substituent dangles or a polymer and a dissolution inhibitor from which an acid-labile substituent dangles. The resist material further contains a photo-acid generating body and a scavenger which reacts with an aryl radical generated in the photolysis of the resist material. The scavenger at least partially prevents the discharge of an aryl compound as gas and includes a stable analogous compound having a 5- or 6-membered heterocyclic structure containing a stable nitroxide radical and a stable analogous compound having an alkyl chain containing a stable nitroxide radical.