发明名称 WASHING METHOD OF HARD SUBSTRATE FOR MAGNETIC RECORDING MEDIUM
摘要 PROBLEM TO BE SOLVED: To realize a washing method of a hard substrate in order to obtain such a magnetic recording medium that a <= several tens ofÅlow flying height of a head at a surface of the hard substrate for the magnetic recording medium is realized. SOLUTION: A low frequency ultrasonic wave washing step is incorporated in a washing method of a hard substrate having a texture formed on a surface of a Ni-P film formed on a hard member plate. For example, a washing method wherein the surface of the substrate is scrubbing washed, ultrasonically washed by a 20-50 kHz low frequency ultrasonic wave in an alkaline detergent solution, successively washed with warm pure water, a pure water and an ultra pure water in this order and finally dryed by using IPA vapor is applied.
申请公布号 JP2000306234(A) 申请公布日期 2000.11.02
申请号 JP19990114488 申请日期 1999.04.22
申请人 FUJI ELECTRIC CO LTD 发明人 TAMURA KOJI
分类号 B08B3/08;B08B3/12;G11B5/84;(IPC1-7):G11B5/84 主分类号 B08B3/08
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