发明名称 |
Use of intersecting subresolution features for microlithography |
摘要 |
A method for creating an image on an image plane utilizing a photomask comprised of a plurality of intersecting subresolution features. Energy created by an energy source is projected through the subresolution features which diffract the light to produce constructive or positive interference thereby resulting in an image being formed on the image plane that is different than the image or pattern of subresolution features on the photomask.
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申请公布号 |
US6139994(A) |
申请公布日期 |
2000.10.31 |
申请号 |
US19990344251 |
申请日期 |
1999.06.25 |
申请人 |
BROEKE, DOUG VAN DEN;CHEN, FUNG |
发明人 |
BROEKE, DOUG VAN DEN;CHEN, FUNG |
分类号 |
G03F1/14;G03F7/20;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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