发明名称 |
Tantalum and tantalum-based films formed using fluorine-containing source precursors and methods of making the same |
摘要 |
A method for chemical vapor deposition of a film comprising tantalum onto a substrate includes introducing into a deposition chamber: (i) a substrate; (ii) a source precursor in the vapor state; and (iii) a reactant gas, and maintaining the temperature of the substrate within the chamber as from about 70 DEG C. to about 675 DEG C. for a period of time sufficient to deposit a film comprising tantalum on the substrate. The source precursor has a formula (I):Ta(F5-q-p)(Xq-p)(Rp)(I)wherein X is selected from the group consisting of bromine, iodine, chlorine, and combinations thereof; q is an integer from 0 to 4; p is an integer from 0 to 4; and R is selected from the group consisting of hydrogen and lower alkyl.
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申请公布号 |
US6139922(A) |
申请公布日期 |
2000.10.31 |
申请号 |
US19990313618 |
申请日期 |
1999.05.18 |
申请人 |
GELEST, INC.;THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK |
发明人 |
KALOYEROS, ALAIN E.;ARKLES, BARRY C. |
分类号 |
C23C16/14;C23C16/18;C23C16/34;C23C16/42;H01L21/28;H01L21/285;H01L21/768;(IPC1-7):C23C16/08;H01L21/44 |
主分类号 |
C23C16/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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