发明名称 Water-developable photosensitive resin composition
摘要 A water-developable photosensitive resin composition which comprises: (1) a particulate copolymer comprising, as recurring units in the copolymer, (a) 10 to 95 mole % of an aliphatic conjugated diene unit, (b) 0.1 to 30 mole % of a monomer unit having at least one polymerizable unsaturated group and at least one functional group selected from the group consisting of carboxyl group, amino group, hydroxyl group, epoxy group, sulfonic acid group and phosphoric acid group, and (c) 0.1 to 20 mole % of a monomer unit having at least two polymerizable unsaturated groups; (2) at least one copolymer selected from the group consisting of (i) a block-like copolymer composed of two or more polymeric segments having a sulfonic acid group in at least one of the polymeric segments, (ii) a block-like copolymer composed of two or more polymeric segments having a polyurethane segment in at least one of the polymeric segments, and (iii) a copolymer of ethylene and an alpha -olefin having 3 to 20 carbon atoms; (3) a photopolymerizable unsaturated compound; and (4) a photopolymerization initiator.
申请公布号 US6140017(A) 申请公布日期 2000.10.31
申请号 US19980037538 申请日期 1998.03.10
申请人 JSR CORPORATION 发明人 KOSHIMURA, KATSUO;TANAKA, TADAAKI;SHIMADA, NOBORU;YASUDA, KENJI
分类号 G03F7/033;(IPC1-7):G03C1/73 主分类号 G03F7/033
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