Pattern formation method and method and apparatus for production of a semiconductor device using said method,申请号EP19950401955-传众专利搜索

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发明名称	Pattern formation method and method and apparatus for production of a semiconductor device using said method
摘要
申请公布号	EP0698824(B1)	申请公布日期	2000.10.18
申请号	EP19950401955	申请日期	1995.08.25
申请人	SONY CORPORATION	发明人	OGAWA, TOHRU
分类号	G03F7/20;(IPC1-7):G03F7/20	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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