METHOD FOR ANALYZING THE CHEMICAL COMPOSITION OF A THIN FILM AND METHOD FOR CONTROLING THE GROWTH OF THE THIN FILM

摘要

PURPOSE: A method for analyzing the chemical composition of a thin film and a method for controlling the growth of the thin film are provided to analyze the chemical composition of the thin film without using the database of the thin film by analyzing the suction structure spectrum ε2. CONSTITUTION: A suction structure spectrum ε2 of a thin film consisting of at least two kinds of chemical materials is obtained by an optical ellipsometry. The thin film is formed on a semiconductor substrate. Then, the suction structure spectrum ε2 of the thin film is quantitatively analyzed. Based on the analyzing data, the chemical composition of the thin film is analyzed. The semiconductor substrate includes a transparent substrate, an opaque substrate and a multi layer substrate.