METHOD FOR CORRECTING IMAGE FAULTS

摘要

The invention relates to a method for correcting image faults, especially of the proximity effect, in electron beam writers or laser beam writers during the production of masks. The image faults are corrected by modifying an electronic mask design so that a modified mask design leads to the production of figures after the mask has been illuminated by a mask writer. The dimensions of said figures approach, as nearly as possible, those of an original mask design or of a specified mask, whereby a control system which is dependent upon process conditions is established and can be represented in tables. The entries into the tables represent correction values which are dependent on parameters that describe process conditions. Said correction values can be used as pre-calculated correction elements in a successive correction operation.