| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface treatment apparatus in which the hydrogen concentration of the surface atomic layer of a sample is measured in the surface treatment apparatus without extracting the sample in atmospheric air. SOLUTION: An ion source 11 injecting ions into a vacuum chamber 2 and a detector 12 detecting recoil atoms made to recoil by injection ions are communicated and mounted in the vacuum chamber 2 installed to the surface treatment apparatus for measuring the hydrogen concentration of a thin-film surface in the surface treatment apparatus (a film deposition device) by an elastic recoil- particle detecting method by a low-energy ion scattering spectral method. The hydrogen concentration of the surface atomic layer of a sample (a substrate 20) is measured in the surface treatment apparatus without extracting the sample in atmospheric air, by conducting in the vacuum chamber 2 of the surface treatment apparatus by using the elastic recoil-particle detecting method by the low-energy ion scattering spectral method.
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