| 摘要 |
PURPOSE: A system for coating and developing a photoresist and bake unit is to prevent an air flow introduced in the bake unit and isolate heat influenced on a bake chamber of the bake unit, thereby equally form a width of a wire. CONSTITUTION: A system for coating and developing a photoresist comprises a housing(200), a coating portion(220) for coating the photoresist on a semiconductor wafer, a developing portion for developing the photoresist, a bake unit(240) for heating the wafer at a desired temperature, a robot(210) for transferring the wafer, an air conditioner, an air filter(273a,273b) disposed at an upper portion of the housing to filter air supplied from the air conditioner. In the system, the clean air supplied through the air filter forms turbulent air at an upper portion of the bake unit to prevent the air from being introduced into a front face of the bake unit. The bake unit comprises a case having a wafer passage formed at a front face thereof and an opening formed at a rear face thereof, a bake chamber, a heat-isolating portion for isolating the bake chamber from the heat.
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