| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion implanter of a long life, high reliability at low cost, capable of conducting uniform ion implantation to a substrate in a three- dimensional shape. SOLUTION: This ion implantater implants ions into a substrate 10 by applying a voltage on the substrate 10 placed in a vacuum container 1 and by generating a discharge plasma in the vacuum container 1. The vacuum container 1 is evacuated to be vacuum inside thereof and supplied with a gas of a substance to be ion-implanted. The ion implanter comprises a step-up transformer 42 and a switching element 40 connected to the primary side of the step-up transformer 42.
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