发明名称 NEAR VISUAL-FIELD OPTICAL PROBE AND ITS MANUFACTURE
摘要 PROBLEM TO BE SOLVED: To prevent a light-shielding film around a small opening from being heated by providing a layer that is made of a material with improved thermal conductivity at a part in close contact with the small opening. SOLUTION: First, a taper part 42 is formed in a silicon substrate 41 by the etching method with the anisotropy of silicon, and then an SiO2 layer is formed on its upper surface by thermal oxidation or the like. After that, the silicon substrate 41 is eliminated by etching from a lower part, thus exposing the taper part 42 to a lower side. Then, a Cu layer is formed on a lower surface by the electroforming to cover the lower layer of the taper part 42 with the Cu layer. After that, the taper part 42 is exposed to a lower side again by polishing from the lower side. Finally, the SiO2 film is eliminated by the RIE from an upper part, thus manufacturing an optical head. As a result, since heat being generated by a light-shielding film absorbing incidence light is eliminated by the layer of a heat-conductive material, incidence light with a larger intensity can be used, thus capable of giving an output signal with a high S/N ratio.
申请公布号 JP2000266656(A) 申请公布日期 2000.09.29
申请号 JP19990274734 申请日期 1999.09.28
申请人 SEIKO INSTRUMENTS INC 发明人 OMI MANABU;MITSUOKA YASUYUKI;CHIBA TOKUO;MAEDA HIDETAKA;KASAMA NOBUYUKI;KATO KENJI;ARAWA TAKASHI
分类号 G01B11/30;G01Q60/22;(IPC1-7):G01N13/14;G12B21/06 主分类号 G01B11/30
代理机构 代理人
主权项
地址