ISOLATION OF NOVOLAK RESIN WITHOUT HIGH TEMPERATURE DISTILLATION AND PHOTORESIST COMPOSITION THEREFROM

摘要

PURPOSE: A process for fractionation of a novolak resin into different molecular weight fractions useful for high performance light-sensitive photoresist compositions, and a process for making a such a light-sensitive composition useful as a positive-working photoresist are provided. CONSTITUTION: A water insoluble, aqueous alkali soluble novolak resins fractions having consistent molecular weight and superior performance in a photoresist composition, is produced by fractionating novolak resins according to molecular weight. Also provided is a method for producing a photoresist composition from such a novolak resin and for producing semiconductor devices using such a photoresist composition.