发明名称 PLASMA PROCESSING APPARATUS AND METHOD OF MAINTAINING THE SAME
摘要 A plasma processing apparatus and a plasma processing method wherein part replacement and maintenance work can be easily carried out in a processing chamber. The plasma processing device has a vacuum container with a processing chamber (100) therein, plasma generating devices (110 and 101) for generating a plasma in the chamber, and electrodes for holding samples to be processed in the chamber. In this apparatus, the upper wall of the chamber is an openable/closable part, and at least one (110) of the component constituting the plasma generating device including a nonmetal brittle member is arranged on the openable/closable part. The openable/closable part can be stably held with the inner side thereof up by rotating at least one part of the upper wall constituting the top of the chamber around a generally horizontal shaft. The inner side of the openable/closable part is held at an angle less than 30 degrees from the horizontal plane with the component held while the openable/closable part is opened.
申请公布号 WO0055894(A1) 申请公布日期 2000.09.21
申请号 WO2000JP01590 申请日期 2000.03.16
申请人 HITACHI, LTD.;MASUDA, TOSHIO;KANEKIYO, HIROSHI;FUJIMOTO, TETSUO;SUEHIRO, MITSURU;MATANO, KATSUJI;TAKAHASHI, KAZUE 发明人 MASUDA, TOSHIO;KANEKIYO, HIROSHI;FUJIMOTO, TETSUO;SUEHIRO, MITSURU;MATANO, KATSUJI;TAKAHASHI, KAZUE
分类号 H01L21/302;B01J3/02;C23C16/509;H01J37/32;H01L21/00;H01L21/3065;H01L21/683;(IPC1-7):H01L21/306;H01L21/205 主分类号 H01L21/302
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