发明名称 |
METHOD AND APPARATUS FOR IN-LINE OXIDE THICKNESS DETERMINATION IN CHEMICAL-MECHANICAL POLISHING |
摘要 |
<p>In-line thickness measurement of a dielectric film layer on a surface of a workpiece subsequent to a polishing on a chemical-mechanical polishing machine in a polishing slurry is disclosed. The workpiece includes a given level of back-end-of-line (BEOL) structure including junctions. The measurement apparatus includes a platen and an electrode embedded within the platen. A positioning mechanism positions the workpiece above the electrode with the dielectric layer facing in a direction of the electrode. A slurry dam is used for maintaining a prescribed level of a conductive polishing slurry above the electrode, the prescribed level to ensure a desired slurry coverage of the workpiece. A capacitance sensor senses a system capacitance C in accordance with an RC equivalent circuit model, wherein the RC equivalent circuit includes a resistance R representative of the slurry and workpiece resistances and the system capacitance C representative of the dielectric material and junction capacitances. Lastly, a capacitance-to-thickness converter converts the sensed capacitance to a dielectric thickness in accordance with a prescribed system capacitance/optical thickness calibration, wherein the prescribed calibration corresponds to the given level of BEOL structure of the workpiece.</p> |
申请公布号 |
KR100266119(B1) |
申请公布日期 |
2000.09.15 |
申请号 |
KR19970048028 |
申请日期 |
1997.09.22 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION. |
发明人 |
LUSTIG, NAFTALI E.;SANDWICK, THOMAS E.;GUTHRIE, WILLIAM L. |
分类号 |
G01B7/06;B24B37/013;B24B49/04;G01N27/22;H01L21/304;H01L21/3105;H01L21/66;(IPC1-7):H01L21/66 |
主分类号 |
G01B7/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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