发明名称 PRODUCTION OF PATTERN FORMED BODY
摘要 <p>PROBLEM TO BE SOLVED: To produce a pattern formed body by a method by which a pattern can be formed with high precision, post-treatment after exposure is not necessary and the deterioration of the pattern formed body itself is not caused because a photocatalyst is not contained in the pattern formed body. SOLUTION: A substrate 1 with at least a photocatalyst-containing layer 2 and a substrate 6 for a pattern formed body with at least a characteristic varying layer 5 whose characteristic is varied by the action of the photocatalyst in the photocatalyst-containing layer 2 are disposed in such a way that the photocatalyst-containing layer 2 and the characteristic varying layer 5 come in contact with each other and exposure is carried out. The characteristic of the characteristic varying layer 5 in the exposed part is varied and then the substrate 1 on the photocatalyst-containing layer side is removed to obtain the objective pattern formed body with a pattern having a varied characteristic on the characteristic varying layer 5.</p>
申请公布号 JP2000249821(A) 申请公布日期 2000.09.14
申请号 JP19990053774 申请日期 1999.03.02
申请人 DAINIPPON PRINTING CO LTD 发明人 KOBAYASHI HIRONORI;OKABE MASAHITO;YAMAMOTO MANABU
分类号 G02B5/20;G03F7/00;G03F7/004;G03F7/09;(IPC1-7):G02B5/20 主分类号 G02B5/20
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