发明名称 |
PRODUCTION OF PATTERN FORMED BODY |
摘要 |
<p>PROBLEM TO BE SOLVED: To produce a pattern formed body by a method by which a pattern can be formed with high precision, post-treatment after exposure is not necessary and the deterioration of the pattern formed body itself is not caused because a photocatalyst is not contained in the pattern formed body. SOLUTION: A substrate 1 with at least a photocatalyst-containing layer 2 and a substrate 6 for a pattern formed body with at least a characteristic varying layer 5 whose characteristic is varied by the action of the photocatalyst in the photocatalyst-containing layer 2 are disposed in such a way that the photocatalyst-containing layer 2 and the characteristic varying layer 5 come in contact with each other and exposure is carried out. The characteristic of the characteristic varying layer 5 in the exposed part is varied and then the substrate 1 on the photocatalyst-containing layer side is removed to obtain the objective pattern formed body with a pattern having a varied characteristic on the characteristic varying layer 5.</p> |
申请公布号 |
JP2000249821(A) |
申请公布日期 |
2000.09.14 |
申请号 |
JP19990053774 |
申请日期 |
1999.03.02 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
KOBAYASHI HIRONORI;OKABE MASAHITO;YAMAMOTO MANABU |
分类号 |
G02B5/20;G03F7/00;G03F7/004;G03F7/09;(IPC1-7):G02B5/20 |
主分类号 |
G02B5/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|