| 摘要 |
PROBLEM TO BE SOLVED: To obtain high electromagnetic shielding capability by forming on a transparent substrate a layer comprising a transparent substrate or the like, an Ag layer, a metal barrier layer of ZnAl, a layer comprising a transparent oxide layer or the like, an Ag layer, a metal barrier layer of ZnAl, and a layer comprising a transparent oxide layer with their thickness controlled within respective specified ranges in this order. SOLUTION: A first layer comprising a transparent substrate/transparent oxide layer and/or a transparent nitride layer, a second layer comprising an Ag layer, a third layer comprising a metal barrier layer of ZnAl, a fourth layer comprising a transparent oxide layer and/or a transparent nitride layer, a fifth layer comprising an Ag layer, a sixth layer comprising a metal barrier layer of ZnAl, and a seventh layer comprising a transparent oxide layer and/or a transparent nitride layer, are formed on a transparent substrate in this order. The film thickness is controlled to 26-36 nm for the first layer, 15-50 nm for the second layer and fifth layer, 1.5 nm or less for the third layer and sixth layer, 80-100 nm or less for the fourth layer, and 23-40 nm for the seventh layer. Thus, high electromagnetic shielding capability is obtained.
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