发明名称 ELECTRON BEAM DRAWING METHOD, EQUIPMENT AND DEVICE MANUFACTURED BY USE OF THEM
摘要 PROBLEM TO BE SOLVED: To limit a real-time tracking deflection to a very small volume, to make drawings only in a range where no glitch noise occur, and to make drawings accurately without being affected by glitch noises. SOLUTION: This electron beam drawing method is carried out, in a manner where a difference between shot coordinates and a pattern is corrected on defection distortion by a following deflection arithmetic part 6, then a following deflection volume at the position of a specimen pad is divided into a following deflection volume (synchronous following deflection volume) which is sampled with a timing of figure drawing (shot) and a real-time following deflected amount where a synchronous following deflected amount serves as an origin, and the synchronous following deflected volume is outputted through a register 13, a digital arithmetic unit 21, and a D/A converter 15 synchronizing with shot timing. The real-time following deflection volume is outputted in real time through a digital arithmetic device 14 and a D/A converter 16. A deflector is driven by drawing deflection data outputted from a pattern generator 1, together with the above both following deflected amounts added to the deflection data by an analog adding machine.
申请公布号 JP2000252184(A) 申请公布日期 2000.09.14
申请号 JP19990049390 申请日期 1999.02.26
申请人 HITACHI LTD 发明人 TAKAHASHI HIROYUKI;OKUMURA MASAHIDE;NAGATA KOJI;ANDO MASAAKI
分类号 H01L21/027;G03F7/20;G03F9/00;H01J37/147;H01J37/304;H01J37/305;(IPC1-7):H01L21/027 主分类号 H01L21/027
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