发明名称 METHOD AND DEVICE FOR OPERATING VARIABLE OPENING IN ION IMPLANTATION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method and a device for operating an adjustable opening used for a beam line of an ion implantation device. SOLUTION: A variable opening assembly 30 is operated to adjust quantity of an ion beam current passing through into an ion implantation device. In the process, an ion beam is measured in a prescribed position of the ion implantation device by using an electric current detector to compare this measured ion beam current with a desired ion beam current to output a control signal on the basis of this comparison to adjust a gap 50 being formed of opposed first/second opening plates 44A, 44B and passing the ion beam between these opening plates in response to the control signal for controlling quantity of the passing ion beam current. This device and method can provide a quick, direct and accurate mechanism for imparting a large change to the ion beam current without readjusting an electric current source.
申请公布号 JP2000243341(A) 申请公布日期 2000.09.08
申请号 JP20000039407 申请日期 2000.02.17
申请人 EATON CORP 发明人 LOOMIS PAUL ASHBY;RUTISHAUSER HANS JURG;LU JUN;SUGITANI MICHIRO;MURAKAMI SUSUMU;SOGABE HIROSHI
分类号 H01J37/00;C23C14/48;H01J37/09;H01J37/304;H01J37/317;H01L21/265;(IPC1-7):H01J37/317 主分类号 H01J37/00
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