| 摘要 |
PROBLEM TO BE SOLVED: To simplify operation and data processing required for correcting a light proximity effect of a light shield film pattern. SOLUTION: A serif figure 37 related to a light shield film pattern 35 constituting a layout-designed exposure pattern is formed. The light shield film pattern 35 and the serif figure 37 are figure-operated, and the light shield film pattern 35 is corrected, and the light proximity effect at the time of exposing by this light shield pattern 35 is corrected. Then, the operation processing required for correcting the light proximity effect for the light shield film pattern 35 is simplified, and the processing time required for correcting the light proximity effect is shortened. |
