发明名称 IMPROVED STENCIL
摘要 <p>A stencil is disclosed in which the area of each aperture in the upper surface is greater than the area of the apertures in the lower surface which comes into contact with a substrate upon which materials are deposited. The differential areas in the upper surface and in the lower surface serve to control the amount of material which is deposited through the stencil and onto the substrate.</p>
申请公布号 WO2000048845(A1) 申请公布日期 2000.08.24
申请号 US2000004300 申请日期 2000.02.18
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