Antireflective coating material for photoresists

摘要

The present invention relates to an antireflective coating composition comprising an admixture of: a) a polymer defined by the following structure: where, R1 & R2 are independently hydrogen, or C1 to C5 alkyl R3 is a methyl, ethyl, propyl or butyl group R4-R7 are independently hydrogen, or C1 to C5 alkyl n=10 to 50,000 (b) a fluorine-containing, sparingly water-soluble (0.1%-10% by weight in water) organic C3-C13 aliphatic carboxylic acid; (c) a non-metallic hydroxide; and (d) a solvent. The invention also relates to a method for producing such an antireflective coating composition and to a method for producing a microelectronic device using such an antireflective coating composition in conjunction with a photoresist composition.