发明名称 PATTERN FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To enable design with separated functions and to find various uses by forming a laminate consisting of an energy beam sensitive layer and an insulating coat layer in place of an insulating layer using a photosensitive resin composition. SOLUTION: An energy beam sensitive coat layer is laminated on the surface of a resin layer for forming an insulating coat. In order to obtain a desired pattern, irradiation with active energy beams or heat rays through a mask or direct irradiation is carried out and a resist pattern coat of the energy beam sensitive coat layer is formed by deyeloping the energy beam sensitive coat layer. The resin layer for forming an insulating coat is then removed by development so as to obtain the desired pattern.
申请公布号 JP2000227665(A) 申请公布日期 2000.08.15
申请号 JP19990065749 申请日期 1999.03.12
申请人 KANSAI PAINT CO LTD 发明人 IMAI GENJI;ONISHI KENGO;HONMA HIROYUKI;KOGURE HIDEO
分类号 H05K3/00;G03F7/00;G03F7/004;G03F7/09;G03F7/30;G03F7/40;H05K1/03;H05K3/28 主分类号 H05K3/00
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